Quartz Wafer 6025 LSI Photo Mask Synthetic Quartz Substrate (Made in Japan)

♦️ Due to its high purity, it is possible to suppress contamination of the material.

♦️ Extremely stable against a wide range of solutions and withstands long-term use.

♦️ It has an extremely high transmittance across a broad wavelength range from infrared to ultraviolet light.

♦️6025 photomask substrate used in LSI manufacturing with high flatness, low thickness variation, and smoothness.

Quartz Wafer Specification:

• Material: Synthetic quartz
• Size: 152x152±0.2mm;
• Flatness: 2um;
• Thickness:6.35mm±0.1mm;
• Made in Japan
• Lead time: About 2 weeks;