Silicon Carbide Substrate 8inch N Type Production/Dummy Grade 4H SiC Wafer IGBT
Grade:P-mos Grade
Thickness:350um
Quantity:2 Pieces
数量:
♦️High-quality SiC wafer for Research and Experiment.
♦️Provide small quantities, special specifications products, and customized services.
♦️Global shipping, secure payment, large inventory.
♦️Minimum delivery time within 1 week. Shipped by FedEx, DHL,UPS, etc.
SiC Substrate Specification:
-
Size: 8inch;
-
Type: N;
-
Diameter: 200mm±0.2;
-
Thickness: 350um±25;
-
Surface Orientation: 4 toward [11-20]±0.5°;
-
Notch orientation:[1-100]±5°;
-
Notch depth: 1~1.5mm;
-
Micropipe: <0.2ea/cm2;
-
Resistivity: 0.015~0.025Ω;
-
TSD: <300ea/cm2;
-
TED: <3000ea/cm2;
-
BPD: <1000ea/cm2;
-
TTV≤7um;
-
Warp≤30um;
-
Bow≤-<20umum;
-
Poly areas: None;
-
Chips/Indents: None;
-
Scratch:≤5,Total Length≤Diameter;
-
Stain: None;
-
Wafer edge: Chamfer;
-
Surface finish: Double Side Polish, Si Face CMP;
-
Packing: Multi-wafer Cassette Or Single Wafer Container;
-
Production time: 2~3weeks;
选择方案
Grade:P-mos Grade
Thickness:350um
Quantity:2 Pieces
数量:
♦️High-quality SiC wafer for Research and Experiment.
♦️Provide small quantities, special specifications products, and customized services.
♦️Global shipping, secure payment, large inventory.
♦️Minimum delivery time within 1 week. Shipped by FedEx, DHL,UPS, etc.
SiC Substrate Specification:
-
Size: 8inch;
-
Type: N;
-
Diameter: 200mm±0.2;
-
Thickness: 350um±25;
-
Surface Orientation: 4 toward [11-20]±0.5°;
-
Notch orientation:[1-100]±5°;
-
Notch depth: 1~1.5mm;
-
Micropipe: <0.2ea/cm2;
-
Resistivity: 0.015~0.025Ω;
-
TSD: <300ea/cm2;
-
TED: <3000ea/cm2;
-
BPD: <1000ea/cm2;
-
TTV≤7um;
-
Warp≤30um;
-
Bow≤-<20umum;
-
Poly areas: None;
-
Chips/Indents: None;
-
Scratch:≤5,Total Length≤Diameter;
-
Stain: None;
-
Wafer edge: Chamfer;
-
Surface finish: Double Side Polish, Si Face CMP;
-
Packing: Multi-wafer Cassette Or Single Wafer Container;
-
Production time: 2~3weeks;
Grade:P-mos Grade
Thickness:350um
Quantity:2 Pieces
数量:
♦️High-quality SiC wafer for Research and Experiment.
♦️Provide small quantities, special specifications products, and customized services.
♦️Global shipping, secure payment, large inventory.
♦️Minimum delivery time within 1 week. Shipped by FedEx, DHL,UPS, etc.
SiC Substrate Specification:
-
Size: 8inch;
-
Type: N;
-
Diameter: 200mm±0.2;
-
Thickness: 350um±25;
-
Surface Orientation: 4 toward [11-20]±0.5°;
-
Notch orientation:[1-100]±5°;
-
Notch depth: 1~1.5mm;
-
Micropipe: <0.2ea/cm2;
-
Resistivity: 0.015~0.025Ω;
-
TSD: <300ea/cm2;
-
TED: <3000ea/cm2;
-
BPD: <1000ea/cm2;
-
TTV≤7um;
-
Warp≤30um;
-
Bow≤-<20umum;
-
Poly areas: None;
-
Chips/Indents: None;
-
Scratch:≤5,Total Length≤Diameter;
-
Stain: None;
-
Wafer edge: Chamfer;
-
Surface finish: Double Side Polish, Si Face CMP;
-
Packing: Multi-wafer Cassette Or Single Wafer Container;
-
Production time: 2~3weeks;
♦️High-quality SiC wafer for Research and Experiment.
♦️Provide small quantities, special specifications products, and customized services.
♦️Global shipping, secure payment, large inventory.
♦️Minimum delivery time within 1 week. Shipped by FedEx, DHL,UPS, etc.
SiC Substrate Specification:
- Size: 8inch;
- Diameter: 200mm±0.2;
- Thickness: 500um±25;
- Surface Orientation: 4 toward [11-20]±0.5°;
- Notch orientation:[1-100]±1°;
- Notch depth: 1±0.25mm;
- Micropipe: <5cm2;
- Hex Plates: area≤5%;
- Resistivity: 0.014~0.028Ω;
- EPD: N/A;
- TED: N/A;
- BPD: N/A;
- TSD: N/A;
- SF: N/A;
- TTV≤15um;
- Warp≤60um;
- Bow≤40um;
- Poly areas: ≤5%;
- Chips/Indents: Qty:2≤1mm Width and Depth;
- Scratch: Cumulative Length≤1.5 Wafer Diameter;
- Stain: None;
- Wafer edge: Chamfer;
- Surface finish: Double Side Polish, Si Face CMP;
- Packing: Multi-wafer Cassette Or Single Wafer Container;
